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Real-time particle intelligence for advanced manufacturing
We use a patented multi-sensor technology combined with human and artificial intelligence to bring you real-time CMP quality data.
Keep sample integrity
Built with durable and non-reactive materials like Teflon and sapphire. No sample dilution or separate handling required.Â
Collect data on slurries with particle size sensitivity from 100 nm to over 10 microns and across 9 orders of magnitude of concentration. Don’t sacrifice PSD data for LPC data.
We bridge the gap between Particle Size Distribution and Large Particle Concentration
Eliminate CMP bottlenecks
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